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Introduction to Focused Ion Beam Nanometrology

David C. Cox (author)

ISBN: 9781681740201

Publication Date: Oct 2015

Format: Paperback

Describes modern focused ion beam microscopes and techniques and how they can be used to aid materials metrology and as tools for the fabrication of devices that in turn are used in many other aspects of fundamental metrology. Beginning with a description of the currently available instruments, the book then gives an overview of ion solid interactions and how the different types of instrument can be applied.
£46.50

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This book describes modern focused ion beam microscopes and techniques and how they can be used to aid materials metrology and as tools for the fabrication of devices that in turn are used in many other aspects of fundamental metrology. Beginning with a description of the currently available instruments including the new addition to the field of plasma-based sources, it then gives an overview of ion solid interactions and how the different types of instrument can be applied. Chapters then describe how these machines can be applied to the field of materials science and device fabrication giving examples of recent and current activity in both these areas.
Imprint IOP Concise Physics
Pages 104
Dimensions 254 x 175
Date Published 30 Oct 2015
Publisher Morgan & Claypool Publishers
Subject/s Engineering measurement & calibration  
David C. Cox received his PhD from the department of Metallurgy and Materials Science University of Cambridge, UK in 2001. He is currently a senior research fellow at the Advanced Technology Institute, University of Surrey, UK and has been seconded to the National Physical Laboratory, UK as a senior research scientist since 2005. Having a broad background in industry and academia covering many aspects of materials science, physics and electronic engineering, he has published close to 100 articles at the time of writing. Largely associated with both the Quantum Metrology and Materials groups at NPL, his most recent research work has concentrated on the area of using focused ion beam to fabricate devices for quantum metrology. Additionally, he has developed a strong interest in wider aspects of FIB fabrication and fundamental understanding of how focused ion beam can be used to study materials and the errors associated with aspects of the technique.

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